High-k And CVD ALD Metal Precursors Market Segment Analysis By Technology, Region And Forecast Till 2028
San Francisco, 11 Aug 2021: The Report High-k And CVD ALD Metal Precursors Market Size, Share & Trends Analysis Report By Technology (Interconnect, Capacitors, Gates), By Region (North America, Europe, Asia Pacific, Middle East & Africa, Latin America), And Segment Forecasts, 2021 - 2028 The global high-k and CVD ALD metal precursors market size is projected to reach USD 761.1 million by 2028, registering a CAGR of 6.2% from 2021 to 2028, according to a new report by Grand View Research, Inc. The trend of miniaturization of semiconductor and electronic devices and the need for enhancing their performance is expected to drive the market growth. Atomic Layer Deposition (ALD) is the subclass of the Chemical Vapor Deposition (CVD) process, which is used to manufacture thin films. The ALD method is used for depositing multi-component thin films by co-injecting precursors, such as Hf and Si, for forming a single-layer homogenous film used in several applications, such as self-a